New
facilities available:
Advanced
Materials Growth Facilities
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Advanced Materials and Surfaces Group, Prof M E Pemble and Dr Ian Povey
http://www.tyndall.ie/research/ams-group/index.html
Introduction:
This
new facility which underpins the recently announced
Strategic Research Cluster lead by Martyn Pemble entitled
'FORME'- for 'Functional Oxides and Related Materials for
Electronics', contains 3 laboratory
scale and 2 commercial scale ALD systems, complete with
facilities for full electrical characterisation (J-V, C-V,
breakdown voltage, measurement of dielectric constant). Via
the facilities available eleswhere within FORME we can arrange
for high-resultion TEM analysis and surface analysis by XPS.
Tyndall will also be acquring its own new TEM facilities
during the latter part of 2008.
Chemical Vapour Deposition:
Atmospheric or reduced pressures, growth of oxides and nitrides e.g.
ZnO, TiO2, GaN, TiN, Al2O3,
SiO2, templated growth, surface catalysed CVD
Liquid Injection or Aerosol Assisted Chemical Vapour Deposition (DLICVD and AACVD):
Atmospheric or reduced pressure growth, ZnO,
TiO2, direct nanoparticle incorporation into films, templated growth, use of non-volatile precursors, complex oxides such as perovskites, ferroelectric and ferromagnetic materials
CVD
and Aerosol-assisted (direct liquid injection) CVD
AACVD
Atomic Layer Deposition (ALD):
High-k dielectrics inc.
HfO2 and La2O3, Al2O3,
TiO2, VO2 thermochromic materials, Pt, Ir, Cu CuO
Experimental
reactor ALD1 at Tyndall, equipped with in-situ monitoring
facilities (diode laser spectroscopy)
Summer
2008 - We will
be taking delivery of 2 commercial (8 inch) scale ALD systems
from Cambridge Nanotech
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Single
chamber Fuji F200 LLC system complete with load lock,
spare chamber and remote plasma sources. This will be
deployed with in-situ monitoring in the research lab. |
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Dual
chamber Fuji F202 DCS system complete with dual remote
plasma sources. The F202 system will be located in the
Central Fabrication Facility. |
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