Simulation of atomic layer deposition

molecule surface

atomic interface

flash tem

Si chip by shapeshifter

Atomic layer deposition (ALD) of high-k dielectrics for capacitors and transistors:

Atomic layer deposition of metals:

  • Noble metal ALD
  • Precursor modelling for ALD of copper
  • Reduction of copper oxide surface to copper metal
Contact: 

Simon Elliott

Ireland fund ecsf ucc
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