Block copolymer lithography: feature size control and extension by an over-etch
Peer-reviewed journal article
[Senthamaraikannan, Ramsankar],[Rasappa Sozaraj],[Faulkner, Colm],[Gleeson, Peter]
Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene-b-polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed.
EU FP7 NMP project, LAMAND (grant number 245565) project and the Science Foundation Ireland
THIN SOLID FILMS
Thin Solid Films
[Mick Morris][Justin Holmes][Dipu Borah][Matthew Shaw]