Block copolymer lithography: feature size control and extension by an over-etch

Publication type: 
Peer-reviewed journal article
All authors: 
[Senthamaraikannan, Ramsankar],[Rasappa Sozaraj],[Faulkner, Colm],[Gleeson, Peter]
Theme: 
Nanoelectronics
Abstract: 
Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene-b-polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed.
Tags: 
Block copolymers
Lithgraphy
Etch
Date accepted: 
05/09/2012
Publication date: 
17/12/2012
Funder: 
EU FP7 NMP project, LAMAND (grant number 245565) project and the Science Foundation Ireland
Journal abbreviation: 
THIN SOLID FILMS
Journal/Book title: 
Thin Solid Films
Volume: 
522
Page start: 
318
Page end: 
323
URI: 
http://dx.doi.org/10.1016/j.tsf.2012.09.017
Year: 
2013
Document Controller: 
[Mick Morris][Justin Holmes][Dipu Borah][Matthew Shaw]
Ireland fund ecsf ucc
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