Epitaxy and Physics of Nanostructures

 

Equipment

The Epitaxy and Physics of Nanostructures laboratory investigates the epitaxial growth mechanism and the physics of a variety of semiconductor structures. In particular, we undertake fundamental studies of the growth mechanism and the optical properties of site controlled quantum dots (QDs) obtained by growing in pre-patterned GaAs substrates. Our field of interest spans as far as optoelectronic and electronic devices, with special attention to light emitting sources at telecom wavelengths.

The group at the moment comprises three PhD students and a postdoctoral fellow

The group is well equipped to tackle its mission.

18EX7230_RT8The MOVPE system: Aixtron 200, double reactor: 1x2” and 3x2”.

 

 

 

 

Carrier gas: Nitrogen.

Sources:

Group III precursors: TMGa, TEGa, TMAl, TMIn;

Group V precursors AsH3, PH3, TMSb, U-DMHy

Dopant sources: Si2H6, CBr4, DEZn

 

 

 

The cryogenic microPl laboratory

 

DSC_0039
 

 

 


Characteristic features:  an ARS  low vibration,

low temperature (~7K) closed cycle cryostat

Two Jobin Yvon 1 metre spectrometers,

one nitrogen cooled CCD  and one InGaAs array .

Photon correlation set-up under construction,

Timeresolved measurements capability in the visible and near infrared.

Supercontinuum laser for pulsed excitation

arsblocks2a

 

 

Advanced Research Systems, Inc.

 

 

 

 

The atomic force microscopy system

Veeco Multimode V

 

 

DSC_0293The single crystal X-ray diffraction system

Panalytical X-pert MRD

 

DSC_0292
 

 

 

 

 


Processing and characterization

DSC_0296
 


Oxygen plasma

 

 

 

 

 

 

 

 


PLASMA SYSTEM TYPE „FEMTO“

 

 

 

 

 

 

Optical microscope

 

Olympus BX51

 

 

C-V profiler

 

 

 

 

 

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