Hafnia and Zirconia Precursors

Thermal Stability of Precursors for Atomic Layer Deposition of TiO2, ZrO2, and HfO2: An Ab Initio Study of α-Hydrogen Abstraction in Bis-cyclopentadienyl Dimethyl Complexes

The Journal of Physical Chemistry A volume 114 issue 4 pages 1879 to 1886 (2010)

Authors: Aleksandra Zydor, Simon D. Elliott
Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors

Journal of Materials Chemistry volume 18 issue 38 page 4561 (2008)

Authors: Kate Black, Helen C. Aspinall, Anthony C. Jones, Katarzyna Przybylak, John Bacsa, Paul R. Chalker, Stephen Taylor, Ce Zhou Zhao, Simon D. Elliott, Aleksandra Zydor, Peter N. Heys
Mechanism for zirconium oxide atomic layer deposition using bis(methylcyclopentadienyl)methoxymethyl zirconium

Applied Physics Letters volume 91 issue 25 page 253123 (2007)

Authors: J. W. Elam, M. J. Pellin, S. D. Elliott, A. Zydor, M. C. Faia, J. T. Hupp
First principles simulation of reaction steps in the atomic layer deposition of titania: dependence of growth on Lewis acidity of titanocene precursor

Physical Chemistry Chemical Physics volume 14 issue 22 page 7954 (2012)

Authors: Aleksandra Zydor, Vadim G. Kessler, Simon D. Elliott

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