Provas is a Postdoctoral Fellow at Tyndall where he has been working since October 2023. His research focuses on nanowire and nanosheet-based device fabrication and metrology, contributing to ASCENT+ and Applied Materials projects as an academic collaborator.
Trained as a chemist, Provas is particularly involved in the ASCENT+ project related to the structural (XRD, SEM) and electrical (RT IV) characterisation of nanoscale devices. He is also leading two Applied Materials (AMAT) projects: one designing metal silicide interfaces on doped silicon to study contact resistivity, and another exploring selective removal of hydrophobic SiO₂.
With a strong interest in device fabrication, Provas brings an enthusiastic approach and a proven ability to tackle research challenges. His work includes the design of novel nanowire and nanosheet-based devices (particularly 2D TMDs), with a keen interest in semiconductor device physics, optoelectronic device fabrication, and advanced architectures such as Fin-FETs and GAA nodes.
Prior to his current role, Provas worked for 2.5 years at Applied Materials in Mumbai, contributing to thin-film silicon and GaN-based device technologies. He developed high-temperature dielectric surface blocking processes (stable up to 550°C), and led efforts to reduce sidewall defects and improve GaN mLED efficiency through ALD-based passivation—achievements which led to patentable innovations.
He holds a PhD in Chemistry, and previously completed postdoctoral research in India and Israel, focusing on perovskite-based semi-transparent solar cells. Over the years, Provas has built extensive hands-on experience in vacuum-based deposition techniques (ALD, CVD, photothermal, Epi), wet etch processes, and metrology tools including XRD (XRR, HR-XRD, GI-XRD), FESEM, FIB-SEM, Ellipsometry, EDXRF, UV-Vis, FT-IR, AFM, and Raman. He also has experience analysing data from TEM, XPS, SIMS, and cyclic voltammetry.
Click here to view Provas’s Google Scholar profile.
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