ALD of Silicon-Based Materials

Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride

ACS Applied Materials & Interfaces volume 6 issue 13 pages 10534 to 10541 (2014)

Authors: Ciaran A. Murray, Simon D. Elliott, Dennis Hausmann, Jon Henri, Adrien LaVoie
Density Functional Theory Predictions of the Composition of Atomic Layer Deposition-Grown Ternary Oxides

ACS Applied Materials & Interfaces volume 5 issue 9 pages 3704 to 3715 (2013)

Authors: Ciaran Murray, Simon D. Elliott

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