Advanced Materials and Surfaces Group (AMSG)
Innovation through materials design and process development
The Advanced Materials & Surfaces Group (AMSG) was formally created in February 2004 with the arrival of Professor Martyn Pemble from the University of Salford, UK, where he held the post of Chair of Physical Chemistry. The current team has evolved since this period to gain global recognition through numerous national and international collaborative research projects. A wide range of advances in both industry relevant application areas and basic academic research fields have been achieved to date and ongoing investigations are equally ground breaking.
The AMSG team focus is essentially divided into two main research areas;
Thin films and surface structures, CVD, MOVPE and ALD
- Growth and modification of novel thin film systems and surface structures by chemical vapour deposition (CVD) metal organic CVD (MOCVD), metal organic vapour phase epitaxy (MOVPE) and, most recently, atomic layer deposition (ALD).
Photonic band gap materials
- Synthesis of novel particles and their self-assembly into photonic band gap materials, that are similar in structure to natural opals.
For further details of materials systems and research fields see links below or contact Prof Pemble directly (email@example.com)
• Atomic layer deposition reactors
• Direct liquid injection reactor
• Chemical vapour deposition reactors
• Langmuir-Blodgett trough
• Visible/Near IR/mid IR spectrometer
• Full range of bench top apparatus for chemical synthesis and purification
Prof Pemble is also the coordinator of the prestigious Strategic Research Cluster “FORME” which includes significant teams from Irish Universities and Industry and is leading the way to generate enabling technology for next generation semiconductor devices. Intel and Applied Materials are both partners supporting the cluster. See www.tyndall.ie/forme
a) SEM image showing a thin film opal sample after infilling with Al2O3
b) A series of three different synthetic opals
c) SEM image of a high-k on III-V structure a) with and b) without an Al2O3 interface control layer
The listing of all AMSG Personnel is on a separate web page which can be found by clicking on the link below